炬丰科技-泛半导体行业工艺数据平台-最全面的服务平台

半导体硅片市场

半导体硅片市场

半导体硅片市场

2021年全球半导体硅片市场规模为113亿美元。预计到2030 年将达到 150 亿美元，复合年增长率为 3.6%在预测期间（2022-2030 年）。半导体工业的一个重要组成部分是硅晶片。每个芯片制...

2021年全球半导体硅片市场规模为113亿美元。预计到2030 年将达到 150 亿美元，复合年增长率为 3.6%在预测期间（2022-2030 年）。半导体工业的一个重要组成部分是硅晶片。每个芯片制...

2021年全球半导体...
《炬丰科技-半导体工艺》Al₂O₃ 硬掩模的蚀刻机制

《炬丰科技-半导体工艺》Al₂O₃ 硬掩模的蚀刻机制

《炬丰科技-半导体工艺》Al₂O₃ 硬掩模的蚀刻机制

The etching of high aspect ratio structures in silicon via the Bosch process is essential in modern ...

The etching of high aspect ratio structures in silicon via the Bosch process is essential in modern ...

The etchin...
《炬丰科技-半导体工艺》用于半导体清洗的 3 MHz 兆声波系统的有限元...

《炬丰科技-半导体工艺》用于半导体清洗的 3 MHz 兆声波系统的有限元...

《炬丰科技-半导体工艺》用于半导体清洗的 3 MHz 兆声波系统的有限元...

Megasonic cleaning has been used to clean contaminants from wafer surfaces in semiconductor producti...

Megasonic cleaning has been used to clean contaminants from wafer surfaces in semiconductor producti...

Megasonic ...
《炬丰科技-半导体工艺》通过硅湿法蚀刻制造的一维光子晶体

《炬丰科技-半导体工艺》通过硅湿法蚀刻制造的一维光子晶体

《炬丰科技-半导体工艺》通过硅湿法蚀刻制造的一维光子晶体

Wet anisotropic etching of (1 1 0) silicon for the fabrication of one-dimensional photonic crystals ...

Wet anisotropic etching of (1 1 0) silicon for the fabrication of one-dimensional photonic crystals ...

Wet anisot...
《炬丰科技-半导体工艺》微通道硅湿法刻蚀过程中化学加热的3D模拟与分析模...

《炬丰科技-半导体工艺》微通道硅湿法刻蚀过程中化学加热的3D模拟与分析模...

《炬丰科技-半导体工艺》微通道硅湿法刻蚀过程中化学加热的3D模拟与分析模...

We investigate chemical heating of a Silicon-on-Glass (SOG) chip during a highly exothermic reaction...

We investigate chemical heating of a Silicon-on-Glass (SOG) chip during a highly exothermic reaction...

We investi...
《炬丰科技-半导体工艺》改进CMOS-MEMS电容传感器的金属湿法刻蚀后...

《炬丰科技-半导体工艺》改进CMOS-MEMS电容传感器的金属湿法刻蚀后...

《炬丰科技-半导体工艺》改进CMOS-MEMS电容传感器的金属湿法刻蚀后...

This study presents a process design methodology to improve the performance of a CMOS-MEMS gap-closi...

This study presents a process design methodology to improve the performance of a CMOS-MEMS gap-closi...

This study...
《炬丰科技-半导体工艺》PVP对湿法蚀刻玻璃微通道电渗迁移率的影响

《炬丰科技-半导体工艺》PVP对湿法蚀刻玻璃微通道电渗迁移率的影响

《炬丰科技-半导体工艺》PVP对湿法蚀刻玻璃微通道电渗迁移率的影响

We present an experimental study on the effect of polymer PVP on EOF mobility of microchannels wet e...

We present an experimental study on the effect of polymer PVP on EOF mobility of microchannels wet e...

We present...
《炬丰科技-半导体工艺》高芯片强度的湿法化学硅片减薄工艺

《炬丰科技-半导体工艺》高芯片强度的湿法化学硅片减薄工艺

《炬丰科技-半导体工艺》高芯片强度的湿法化学硅片减薄工艺

We proposed the wet-chemical Si wafer-thinning process and evaluated the damage caused by this proce...

We proposed the wet-chemical Si wafer-thinning process and evaluated the damage caused by this proce...

We propose...
《炬丰科技-半导体工艺》草酸中n-GaN电化学刻蚀工艺及其机理分析

《炬丰科技-半导体工艺》草酸中n-GaN电化学刻蚀工艺及其机理分析

《炬丰科技-半导体工艺》草酸中n-GaN电化学刻蚀工艺及其机理分析

We studied the wet electrochemical etching of n-GaN fifilms in oxalic acid. The electrooxidation pro...

We studied the wet electrochemical etching of n-GaN fifilms in oxalic acid. The electrooxidation pro...

We studied...
《炬丰科技-半导体工艺》硅阳极的典型结构演变

《炬丰科技-半导体工艺》硅阳极的典型结构演变

《炬丰科技-半导体工艺》硅阳极的典型结构演变

Due to its high theoretical capacity, silicon is the most promising anode candidate for future lithi...

Due to its high theoretical capacity, silicon is the most promising anode candidate for future lithi...

Due to its...
《炬丰科技-半导体工艺》pH 值和离子浓度对纳米孔润湿和水结构的影响

《炬丰科技-半导体工艺》pH 值和离子浓度对纳米孔润湿和水结构的影响

《炬丰科技-半导体工艺》pH 值和离子浓度对纳米孔润湿和水结构的影响

In advanced semiconductor manufacturing, deep contact holes with an aspect ratio higher than sixty i...

In advanced semiconductor manufacturing, deep contact holes with an aspect ratio higher than sixty i...

In advance...
《炬丰科技-半导体工艺》一种高分子添加剂对湿法蚀刻过程中铝水平蚀刻速率降...

《炬丰科技-半导体工艺》一种高分子添加剂对湿法蚀刻过程中铝水平蚀刻速率降...

《炬丰科技-半导体工艺》一种高分子添加剂对湿法蚀刻过程中铝水平蚀刻速率降...

The effect of a macromolecular additive on the etching rate of aluminum (Al) horizontal etching in t...

The effect of a macromolecular additive on the etching rate of aluminum (Al) horizontal etching in t...

The effect...
《炬丰科技-半导体工艺》晶圆级单晶金刚石的常用工艺

《炬丰科技-半导体工艺》晶圆级单晶金刚石的常用工艺

《炬丰科技-半导体工艺》晶圆级单晶金刚石的常用工艺

Large size single crystal diamond (SCD) wafer has been strongly desired for various of advanced appl...

Large size single crystal diamond (SCD) wafer has been strongly desired for various of advanced appl...

Large size...
《炬丰科技-半导体工艺》用于光电应用的锗晶片的快速化学减薄

《炬丰科技-半导体工艺》用于光电应用的锗晶片的快速化学减薄

《炬丰科技-半导体工艺》用于光电应用的锗晶片的快速化学减薄

Chemical thinning of germanium wafers was carried out in H3PO4:HNO3:HF aqueous solutions, in which e...

Chemical thinning of germanium wafers was carried out in H3PO4:HNO3:HF aqueous solutions, in which e...

Chemical t...
《炬丰科技-半导体工艺》通过 X 射线光刻在芯片中产生 1800 灰度级...

《炬丰科技-半导体工艺》通过 X 射线光刻在芯片中产生 1800 灰度级...

《炬丰科技-半导体工艺》通过 X 射线光刻在芯片中产生 1800 灰度级...

We present a novel x-ray lithography based micromanufacturing methodology that ofers scalable manufa...

We present a novel x-ray lithography based micromanufacturing methodology that ofers scalable manufa...

We present...
《炬丰科技-半导体工艺》预烘烤在 EUV光刻胶工艺中的作用

《炬丰科技-半导体工艺》预烘烤在 EUV光刻胶工艺中的作用

《炬丰科技-半导体工艺》预烘烤在 EUV光刻胶工艺中的作用

In photoresist processing a prebake is traditionally used after coating the photoresist on a wafer t...

In photoresist processing a prebake is traditionally used after coating the photoresist on a wafer t...

In photore...

1 2 3 4 5 ···>

半导体硅片市场

2021年全球半导体硅片市场规模为113亿美元。预计到2030 年将达到...

2021年全球半导体硅片市场规模为113亿美元。预计到2030 年将达到...

2021年全球半导体硅片市场规模为113亿美元。预计到2030 年将达到 150 亿美元，复合年增长率为 3.6%在预测期间（2...

阅读量：25
《炬丰科技-半导体工艺》Al₂O₃ 硬掩模的蚀刻机制

The etching of high aspect ratio str...

The etching of high aspect ratio str...

The etching of high aspect ratio structures in silicon via the B...

阅读量：38
《炬丰科技-半导体工艺》用于半导体清洗的 3 MHz 兆声波系统的有限元...

Megasonic cleaning has been used to ...

Megasonic cleaning has been used to ...

Megasonic cleaning has been used to clean contaminants from wafe...

阅读量：27
《炬丰科技-半导体工艺》通过硅湿法蚀刻制造的一维光子晶体

Wet anisotropic etching of (1 1 0) s...

Wet anisotropic etching of (1 1 0) s...

Wet anisotropic etching of (1 1 0) silicon for the fabrication o...

阅读量：22
《炬丰科技-半导体工艺》微通道硅湿法刻蚀过程中化学加热的3D模拟与分析模...

We investigate chemical heating of a...

We investigate chemical heating of a...

We investigate chemical heating of a Silicon-on-Glass (SOG) chip...

阅读量：17
《炬丰科技-半导体工艺》改进CMOS-MEMS电容传感器的金属湿法刻蚀后...

This study presents a process design...

This study presents a process design...

This study presents a process design methodology to improve the ...

阅读量：25
《炬丰科技-半导体工艺》PVP对湿法蚀刻玻璃微通道电渗迁移率的影响

We present an experimental study on ...

We present an experimental study on ...

We present an experimental study on the effect of polymer PVP on...

阅读量：15
《炬丰科技-半导体工艺》高芯片强度的湿法化学硅片减薄工艺

We proposed the wet-chemical Si wafe...

We proposed the wet-chemical Si wafe...

We proposed the wet-chemical Si wafer-thinning process and evalu...

阅读量：25
《炬丰科技-半导体工艺》草酸中n-GaN电化学刻蚀工艺及其机理分析

We studied the wet electrochemical e...

We studied the wet electrochemical e...

We studied the wet electrochemical etching of n-GaN fifilms in o...

阅读量：15
《炬丰科技-半导体工艺》硅阳极的典型结构演变

Due to its high theoretical capacity...

Due to its high theoretical capacity...

Due to its high theoretical capacity, silicon is the most promis...

阅读量：6
《炬丰科技-半导体工艺》pH 值和离子浓度对纳米孔润湿和水结构的影响

In advanced semiconductor manufactur...

In advanced semiconductor manufactur...

In advanced semiconductor manufacturing, deep contact holes with...

阅读量：9
《炬丰科技-半导体工艺》一种高分子添加剂对湿法蚀刻过程中铝水平蚀刻速率降...

The effect of a macromolecular addit...

The effect of a macromolecular addit...

The effect of a macromolecular additive on the etching rate of a...

阅读量：16
《炬丰科技-半导体工艺》晶圆级单晶金刚石的常用工艺

Large size single crystal diamond (S...

Large size single crystal diamond (S...

Large size single crystal diamond (SCD) wafer has been strongly ...

阅读量：15
《炬丰科技-半导体工艺》用于光电应用的锗晶片的快速化学减薄

Chemical thinning of germanium wafer...

Chemical thinning of germanium wafer...

Chemical thinning of germanium wafers was carried out in H3PO4:H...

阅读量：19
《炬丰科技-半导体工艺》通过 X 射线光刻在芯片中产生 1800 灰度级...

We present a novel x-ray lithography...

We present a novel x-ray lithography...

We present a novel x-ray lithography based micromanufacturing me...

阅读量：15

1 2 3 4 5 ···>

湿法刻蚀工艺

用光刻方法制成的微图形，只给出了电路的行貌，并不是真正的器件结构。因此需将光刻胶上的微图形转移到胶下面的各层材料上去，这个工艺叫做刻蚀。通常是用光刻工艺形成的光刻胶作掩膜对下层材料进行腐蚀，去掉不要的部分，保留需要的部分。